- Patent Title: Machine-learning approach to holographic particle characterization
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Application No.: US15518739Application Date: 2015-10-12
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Publication No.: US10222315B2Publication Date: 2019-03-05
- Inventor: David G. Grier , Aaron Yevick , Mark Hannel
- Applicant: NEW YORK UNIVERSITY
- Applicant Address: US NY New York
- Assignee: NEW YORK UNIVERSITY
- Current Assignee: NEW YORK UNIVERSITY
- Current Assignee Address: US NY New York
- Agency: Foley & Lardner LLP
- International Application: PCT/US2015/055154 WO 20151012
- International Announcement: WO2016/060995 WO 20160421
- Main IPC: G01B9/021
- IPC: G01B9/021 ; G01N15/14 ; G01N15/02 ; G01N15/10

Abstract:
Holograms of colloidal dispersions encode comprehensive information about individual particles' three-dimensional positions, sizes and optical properties. Extracting that information typically is computation-ally intensive, and thus slow. Machine-learning techniques based on support vector machines (SVMs) can analyze holographic video microscopy data in real time on low-power computers. The resulting stream of precise particle-resolved tracking and characterization data provides unparalleled insights into the composition and dynamics of colloidal dispersions and enables applications ranging from basic research to process control and quality assurance.
Public/Granted literature
- US20170241891A1 MACHINE-LEARNING APPROACH TO HOLOGRAPHIC PARTICLE CHARACTERIZATION Public/Granted day:2017-08-24
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