Invention Grant
- Patent Title: Charged particle beam device, electron microscope and sample observation method
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Application No.: US15514539Application Date: 2014-10-09
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Publication No.: US10204761B2Publication Date: 2019-02-12
- Inventor: Takeshi Sunaoshi , Yasuhira Nagakubo , Kazutaka Nimura
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2014/077034 WO 20141009
- International Announcement: WO2016/056096 WO 20160414
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/28 ; H01J37/20 ; H01J37/18

Abstract:
Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample. The vacuum system is provided with a cold trap that sucks moisture from around the sample and a vacuum gauge that measures the degree of vacuum of the vacuum system.
Public/Granted literature
- US20170221676A1 Charged Particle Beam Device, Electron Microscope and Sample Observation Method Public/Granted day:2017-08-03
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