Invention Grant
- Patent Title: Method for producing deposition mask
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Application No.: US14853934Application Date: 2015-09-14
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Publication No.: US10195838B2Publication Date: 2019-02-05
- Inventor: Yuji Saito , Shuji Kudo , Takayuki Kosuge , Michinobu Mizumura
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Yokohama-shi
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-shi
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2013-053207 20130315
- Main IPC: B32B38/10
- IPC: B32B38/10 ; C23C14/04 ; B32B15/00

Abstract:
The present invention relates to a method for producing a deposition mask having a structure in which a metal mask sheet with a plurality of opening patterns formed is disposed under tension on and fixed to a metal frame, the method including: a first step of bonding a peripheral part of the metal mask sheet to a synthetic fiber mesh to which constant tension is applied; a second step of cutting off a part of the mesh corresponding to a deposition effective region with a size capable of arranging therein the plurality of opening patterns of the metal mask sheet; a third step of connecting and fixing the frame to the peripheral part of the metal mask sheet on an opposite side to the mesh; and a fourth step of removing the mesh from the metal mask sheet.
Public/Granted literature
- US20160001542A1 METHOD FOR PRODUCING DEPOSITION MASK Public/Granted day:2016-01-07
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