Invention Grant
- Patent Title: Reactive gas, reactive gas generation system and product treatment using reactive gas
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Application No.: US14921910Application Date: 2015-10-23
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Publication No.: US10194672B2Publication Date: 2019-02-05
- Inventor: Kevin M. Keener , Mark A. Hochwalt
- Applicant: NanoGuard Technologies, LLC
- Applicant Address: US MO St. Louis
- Assignee: Nanoguard Technologies, LLC
- Current Assignee: Nanoguard Technologies, LLC
- Current Assignee Address: US MO St. Louis
- Agency: Evan Law Group LLC
- Main IPC: A23B9/22
- IPC: A23B9/22 ; A61L2/14 ; A61L2/20 ; A61L9/22
Abstract:
A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas; transporting the reactive gas at least 5 cm away from the HVCP; followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface.
Public/Granted literature
- US20170112157A1 REACTIVE GAS, REACTIVE GAS GENERATION SYSTEM AND PRODUCT TREATMENT USING REACTIVE GAS Public/Granted day:2017-04-27
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