Invention Grant
- Patent Title: Method for manufacturing magnetic memory cells
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Application No.: US15618510Application Date: 2017-06-09
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Publication No.: US10177308B2Publication Date: 2019-01-08
- Inventor: Hongxin Yang , Dong Ha Jung , Jing Zhang , Bing K. Yen
- Applicant: Avalanche Technology, Inc.
- Applicant Address: US CA Fremont
- Assignee: Avalanche Technology, Inc.
- Current Assignee: Avalanche Technology, Inc.
- Current Assignee Address: US CA Fremont
- Agent Bing K. Yen
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L43/08 ; H01L27/22 ; G11C11/16

Abstract:
The present invention is directed to a method for manufacturing a memory cell that includes a magnetic memory element electrically connected to a two-terminal selector. The method includes the steps of depositing a magnetic memory element film stack on a substrate; depositing a selector film stack on top of the magnetic memory element film stack; etching the selector film stack with an etch mask formed thereon to remove at least a switching layer in the selector film stack not covered by the etch mask, thereby forming a selector pillar; depositing a first conforming dielectric layer over the selector pillar and surrounding surface; etching a portion of the first conforming dielectric layer covering the surrounding surface to form a first protective sleeve around at least the switching layer of the selector pillar; and etching the magnetic memory element film stack using the etch mask and the first protective sleeve as a composite mask to form a memory cell pillar.
Public/Granted literature
- US20180358547A1 Method for Manufacturing Magnetic Memory Cells Public/Granted day:2018-12-13
Information query
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