Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15496080Application Date: 2017-04-25
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Publication No.: US10176998B2Publication Date: 2019-01-08
- Inventor: Chun-Yu Wu , Meng-Chun Shih , Chin-Huang Wang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L21/324 ; H01L21/326 ; H01L29/788

Abstract:
A semiconductor device includes a substrate, a dielectric layer and a floating gate. The dielectric layer disposed on the substrate. The floating gate disposed on the dielectric layer. After a first programming process, the floating gate is configured to store first electrons that are to be combined with ions from the dielectric layer. After a second programming process, the floating gate is configured to store second electrons, and a number of the second electrons is larger than a number of the first electrons.
Public/Granted literature
- US20180308700A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-10-25
Information query
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