Invention Grant
- Patent Title: Epi-poly etch stop for out of plane spacer defined electrode
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Application No.: US15291374Application Date: 2016-10-12
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Publication No.: US10173887B2Publication Date: 2019-01-08
- Inventor: Andrew Graham , Gary Yama , Gary O'Brien
- Applicant: Robert Bosch GmbH
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Maginot Moore & Beck LLP
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81C1/00

Abstract:
A device with an out-of-plane electrode includes a device layer positioned above a handle layer, a first electrode defined within the device layer, a cap layer having a first cap layer portion spaced apart from an upper surface of the device layer by a gap, and having an etch stop perimeter defining portion defining a lateral edge of the gap, and an out-of-plane electrode defined within the first cap layer portion by a spacer.
Public/Granted literature
- US20170297896A1 Epi-Poly Etch Stop for Out of Plane Spacer Defined Electrode Public/Granted day:2017-10-19
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