Invention Grant
- Patent Title: Magnetic tunnel junction device utilizing lattice strain
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Application No.: US15283272Application Date: 2016-09-30
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Publication No.: US10170695B2Publication Date: 2019-01-01
- Inventor: Yoshiaki Sonobe , Hiroyoshi Itoh
- Applicant: Yoshiaki Sonobe , Hiroyoshi Itoh
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Priority: JP2015-209528 20151026
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/10 ; G11C11/16 ; H01L27/22 ; H01L43/08 ; H01L43/12

Abstract:
A magnetic tunnel junction device includes a Heusler alloy layer that has not only a perpendicular magnetic anisotropy characteristic, but also a half-metallicity characteristic. For example, the magnetic tunnel junction device includes at least one Heusler alloy layer and a barrier layer. The barrier layer is in contact with the Heusler alloy layer and has an insulating property. A compressive strain is exerted on the Heusler alloy layer in a direction parallel to an interface between the Heusler alloy layer and the barrier layer.
Public/Granted literature
- US20170117458A1 MAGNETIC TUNNEL JUNCTION DEVICE Public/Granted day:2017-04-27
Information query
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