Invention Grant
- Patent Title: Method for manufacturing barrier film with enhanced moisture resistance and barrier film manufactured by the same
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Application No.: US15397578Application Date: 2017-01-03
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Publication No.: US10170643B2Publication Date: 2019-01-01
- Inventor: Ji Yong Lee , Jeong Woo Park , Hyun Jae Kim
- Applicant: Hyundai Motor Company , Industry-Academic Cooperation Foundation, Yonsei University
- Applicant Address: KR Seoul KR Seoul
- Assignee: Hyundai Motor Company,Industry-Academic Cooperation Foundation, Yonsei University
- Current Assignee: Hyundai Motor Company,Industry-Academic Cooperation Foundation, Yonsei University
- Current Assignee Address: KR Seoul KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2016-0129176 20161006
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/0203 ; C23C14/08 ; C23C14/10 ; C23C14/34 ; C23C16/40 ; C23C16/455 ; C23C16/56 ; H01L21/02 ; H01L31/048 ; C23C14/58
Abstract:
A barrier film and a method of manufacturing the barrier film are provided. The method includes performing high-pressure thermal treatment under certain conditions on an oxide thin film deposited by sputtering deposition or atomic layer deposition (ALD) to manufacture a barrier film with improved moisture resistance. According to the method, moisture resistance of the barrier film can be improved at a low process temperature by using both thermal energy and pressure energy. The barrier film provided herein can be useful as a barrier film for solar cells.
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