Invention Grant
- Patent Title: Manufacturing apparatus of semiconductor device, and manufacturing method of semiconductor device
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Application No.: US14634881Application Date: 2015-03-01
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Publication No.: US10170352B2Publication Date: 2019-01-01
- Inventor: Shuji Itonaga , Hideto Furuyama , Mitsuyoshi Endo
- Applicant: ALPAD Corporation
- Applicant Address: JP Tokyo
- Assignee: ALPAD CORPORATION
- Current Assignee: ALPAD CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2014-187116 20140912
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67

Abstract:
A manufacturing apparatus includes a first supporting section to support a first tape section. The first tape section has a first surface facing away from the first supporting section. For example, a semiconductor chip can be disposed on the first surface. A second supporting section of the apparatus supports a second tape section in a facing arrangement with the first tape section. The second tape section has a second surface facing away from the second supporting section. For example, a semiconductor chip can be transferred from the first surface to the second surface in a manufacturing process. A ring element is between the first and second tape sections and surrounds a space between the first and second tape sections. The ring element has a port allowing fluid communication between the space and an outlet port.
Public/Granted literature
- US20160079112A1 MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE Public/Granted day:2016-03-17
Information query
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