Invention Grant
- Patent Title: Dummy pattern addition to improve CD uniformity
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Application No.: US15422689Application Date: 2017-02-15
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Publication No.: US10170309B2Publication Date: 2019-01-01
- Inventor: Daniel J. Dechene , Geng Han
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Scully Scott Murphy and Presser
- Agent Frank Digiglio
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/11 ; H01L21/033 ; H01L27/02 ; H01L27/118
Abstract:
A multiple exposure patterning process includes the incorporation of a dummy feature into the integration flow. The dummy feature, which is placed to overlie an existing masking layer and thus does not alter the printed image, improves the critical dimension uniformity (CDU) of main critical (non-dummy) features at the same masking level.
Public/Granted literature
- US20180233361A1 DUMMY PATTERN ADDITION TO IMPROVE CD UNIFORMITY Public/Granted day:2018-08-16
Information query
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