Invention Grant
- Patent Title: Control system and method for lithography apparatus
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Application No.: US14979583Application Date: 2015-12-28
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Publication No.: US10096450B2Publication Date: 2018-10-09
- Inventor: Herre Tjerk Steenstra
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Rokh Monegier LLP
- Agent David P. Owen
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/24 ; H01J37/04 ; H01J37/317

Abstract:
A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the second time base, determining a first sync value in the first time base corresponding to a second sync value in the second time base, determining a start trigger value in the second time base based on the first sync value and the start time value in the first time base, and initializing the first operation in the first module based on the start trigger value and a current value of the second time base in the first module.
Public/Granted literature
- US20170186582A1 CONTROL SYSTEM AND METHOD FOR LITHOGRAPHY APPARATUS Public/Granted day:2017-06-29
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