Invention Grant
- Patent Title: Capacitor and method of manufacturing capacitor
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Application No.: US15319774Application Date: 2015-05-21
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Publication No.: US10096430B2Publication Date: 2018-10-09
- Inventor: Hirotsugu Ashino , Junya Shiroto
- Applicant: Nippon Chemi-Con Corporation
- Applicant Address: JP Tokyo
- Assignee: Nippon Chemi-Con Corporation
- Current Assignee: Nippon Chemi-Con Corporation
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2014-125269 20140618
- International Application: PCT/JP2015/064563 WO 20150521
- International Announcement: WO2015/194310 WO 20151223
- Main IPC: H01G9/145
- IPC: H01G9/145 ; H01G9/02 ; H01G9/00 ; H01G9/008 ; H01G9/048 ; H01G9/035 ; H01G9/055

Abstract:
A capacitor structure and a manufacturing method achieve suppression of ESR increase and improved productivity for electrolytic capacitors produced by a manufacturing process in which an additive layer is applied to a separator before impregnation of a capacitor element. An anode foil and a cathode foil having undergone an area increasing process are laminated and wound via separators, on which additive layers are formed on respective one surfaces, to produce the capacitor element. At least the separator having a surface at the center side of the capacitor element facing the anode foil and a surface at the outer circumference side of the capacitor element facing the cathode foil, has the additive layer formed on the surface at the center side of the capacitor element.
Public/Granted literature
- US20170125170A1 CAPACITOR AND METHOD OF MANUFACTURING CAPACITOR Public/Granted day:2017-05-04
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