Invention Grant
- Patent Title: Diffusion cooled gas laser arrangement and method for setting the discharge distribution in the case of diffusion cooled gas laser arrangement
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Application No.: US14732353Application Date: 2015-06-05
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Publication No.: US10090633B2Publication Date: 2018-10-02
- Inventor: Markus Schwandt , Stefan Knupfer , Gerold Mahr
- Applicant: TRUMPF Laser- und Systemtechnik GmbH
- Applicant Address: DE Ditzingen
- Assignee: TRUMPF Laser- und Systemtechnik GmbH
- Current Assignee: TRUMPF Laser- und Systemtechnik GmbH
- Current Assignee Address: DE Ditzingen
- Agency: Fish & Richardson P.C.
- Priority: DE102012222469 20121206
- Main IPC: H01S3/038
- IPC: H01S3/038 ; H01S3/097 ; H01S3/223

Abstract:
A diffusion-cooled gas laser system that includes a first and a second electrode and a discharge gap arranged between the electrodes, wherein a dielectric is arranged on at least one of the electrodes on the discharge-gap side. The system is characterized in that the dielectric thickness d/∈res the dielectric for influencing the discharge ∈res of distribution in the discharge gap varies along at least one dimension of the electrode on which the dielectric is arranged, wherein d is the thickness of the dielectric, and ∈res is the resultant constant of the dielectric, and, at its thickest point, has a thickness of at least 1 mm or is greater than one hundredth of the length of the electrode or is greater than one thousandth of a wavelength determined by the frequency of a radiofrequency electrical power to be coupled into the system.
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