Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15267924Application Date: 2016-09-16
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Publication No.: US10090320B2Publication Date: 2018-10-02
- Inventor: Jun Nogami , Gaku Sudo
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L23/02 ; H01L21/768 ; H01L27/11582 ; H01L27/11556 ; H01L23/522 ; H01L23/528

Abstract:
A semiconductor device according to an embodiment, includes a stacked body, a plurality of first terraces, a second terrace, a plurality of interconnects, a plurality of conductive bodies. The stacked body includes a plurality of electrode layers. The stacked body includes a stairstep portion at an end portion of the stacked body. The plurality of first terraces are provided in the stairstep portion. The second terrace is provided in the stairstep portion. The plurality of interconnects are provided from the second terrace to the plurality of first terraces. The plurality of interconnects contact one of the plurality of electrode layers at the stairstep portion. The plurality of conductive bodies are provided above the second terrace. The plurality of conductive bodies extend in a stacking direction of the stacked body. The conductive bodies contact the interconnects above the second terrace.
Public/Granted literature
- US20170338240A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-11-23
Information query
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