Invention Grant
- Patent Title: Semiconductor device and method of manufacturing same
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Application No.: US15453032Application Date: 2017-03-08
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Publication No.: US10090223B2Publication Date: 2018-10-02
- Inventor: Fumihiko Momose , Hiroyuki Nogawa , Yoshitaka Nishimura , Eiji Mochizuki
- Applicant: Fuji Electric Co., Ltd.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Agency: Chen Yoshimura LLP
- Priority: JP2016-089818 20160427
- Main IPC: H01L23/373
- IPC: H01L23/373 ; H01L23/00

Abstract:
A semiconductor device includes a heat-dissipating base, a first conductive layer bonded to the top surface of the heat-dissipating base, an AlN insulating substrate bonded to the top surface of the first conductive layer, and an electrode terminal having one edge bending to form a bonding edge whose bottom surface faces the top surface of the second conductive layer and is solid-state bonded to a portion of the top surface of the second conductive layer. The crystal grain diameter at the bonded interface of the second conductive layer and electrode terminal is less than or equal to 1 μm, and indentations from the ultrasonic horn are left in the top surface of the bonding edge.
Public/Granted literature
- US20170317008A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Public/Granted day:2017-11-02
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