Invention Grant
- Patent Title: Multi-zone pedestal for plasma processing
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Application No.: US15608472Application Date: 2017-05-30
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Publication No.: US10090187B2Publication Date: 2018-10-02
- Inventor: Xing Lin , Bozhi Yang , Jianhua Zhou , Dale R. Dubois , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheriadan LLP
- Main IPC: H05B3/68
- IPC: H05B3/68 ; H01L21/687 ; H01L21/67 ; C23C16/458 ; C23C16/50
Abstract:
A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.
Public/Granted literature
- US20170263484A1 MULTI-ZONE PEDESTAL FOR PLASMA PROCESSING Public/Granted day:2017-09-14
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