Invention Grant
- Patent Title: Load port device and cleaning gas introducing method into a container on a load port
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Application No.: US15372883Application Date: 2016-12-08
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Publication No.: US10090182B2Publication Date: 2018-10-02
- Inventor: Tsutomu Okabe , Koichiro Oikawa
- Applicant: TDK Corporation
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015-242044 20151211
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/02 ; H01L21/673 ; H01L21/67

Abstract:
A load port device includes an installation stand, an opening and closing part, a gas introduction part, and a gas discharge part. The installation stand installs a container whose side surface has a main opening for taking in and out a wafer. The opening and closing part opens and closes the main opening. The gas introduction part introduces a cleaning gas from the main opening into the container. The gas discharge part has a bottom nozzle capable of communicating with a bottom hole formed at a position distant from the main opening more than a bottom surface middle on a bottom surface of the container. The gas discharge part is capable of discharging a gas in the container to an outside of the container.
Public/Granted literature
- US20170170045A1 LOAD PORT DEVICE AND CLEANING GAS INTRODUCING METHOD INTO A CONTAINER ON A LOAD PORT Public/Granted day:2017-06-15
Information query
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