Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US14886996Application Date: 2015-10-19
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Publication No.: US10043761B2Publication Date: 2018-08-07
- Inventor: Chuei-Tang Wang , Vincent Chen , Tzu-Chun Tang , Chen-Hua Yu , Ching-Feng Yang , Ming-Kai Liu , Yen-Ping Wang , Kai-Chiang Wu , Shou Zen Chang , Wei-Ting Lin , Chun-Lin Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/552 ; H01L23/31 ; H01L23/528 ; H01L23/58 ; H01L23/00 ; H01L25/065 ; H01L25/00

Abstract:
A semiconductor device includes a semiconductor die. A dielectric material surrounds the semiconductor die to form an integrated semiconductor package. There is a contact coupling to the integrated semiconductor package and configured as a ground terminal for the semiconductor package. The semiconductor device further has an EMI (Electromagnetic Interference) shield substantially enclosing the integrated semiconductor package, wherein the EMI shield is coupled with the contact through a path disposed in the integrated semiconductor package.
Public/Granted literature
- US20170110412A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-04-20
Information query
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