Invention Grant
- Patent Title: Method of aperture alignment and multi charged particle beam writing apparatus
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Application No.: US15341297Application Date: 2016-11-02
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Publication No.: US10042261B2Publication Date: 2018-08-07
- Inventor: Tsubasa Nanao
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-229833 20151125
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01J37/30 ; H01J37/304 ; H01J37/317
Abstract:
In one embodiment, a method of aperture alignment for a multi charged particle beam writing apparatus includes irradiating a shaping aperture member with a charged particle beam while changing an incident direction, detecting a current for each of the incident directions of the charged particle beam, producing a current distribution map based on the incident direction and the current, and moving the shaping aperture member or a blanking aperture member based on the current distribution map to align the shaping aperture member with the blanking aperture member.
Public/Granted literature
- US20170146910A1 METHOD OF APERTURE ALIGNMENT AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2017-05-25
Information query
IPC分类:
