Invention Grant
- Patent Title: Polymerizable composition for stereolithography
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Application No.: US14431305Application Date: 2013-09-27
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Publication No.: US10040933B2Publication Date: 2018-08-07
- Inventor: Katsuyuki Sugihara , Kuniaki Arai
- Applicant: JNC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JNC CORPORATION
- Current Assignee: JNC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP2012-214200 20120927
- International Application: PCT/JP2013/076250 WO 20130927
- International Announcement: WO2014/051046 WO 20140403
- Main IPC: C08L33/14
- IPC: C08L33/14 ; C08K5/42

Abstract:
Provided is a highly versatile polymerizable composition that allows the fabrication equipment to be washed easily with water, allows the fabricated object to be removed easily from the support, and allows easy curing by application of light rays of 400 nm or higher, in optical 3D fabrication by lamination fabrication. A photopolymerizable composition for stereolithography containing a water-soluble radical polymerizable compound (A) represented by formula (1), a photopolymerization initiator (B) that generates radicals upon application of light rays of a wavelength of 400 nm or higher, and an ionic surfactant (C). In formula (1), R1 is an organic group of valence a, a is an integer of 2 or higher, and R2 is hydrogen or an alkyl having 1-6 carbon atoms.
Public/Granted literature
- US20150232654A1 POLYMERIZABLE COMPOSITION FOR STEREOLITHOGRAPHY Public/Granted day:2015-08-20
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