- Patent Title: Method for manufacturing vertical type light emitting diode, vertical type light emitting diode, method for manufacturing ultraviolet ray light emitting diode, and ultraviolet ray light emitting diode
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Application No.: US14786100Application Date: 2014-03-28
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Publication No.: US10014442B2Publication Date: 2018-07-03
- Inventor: Kyoung Kook Kim , Se Mi Oh
- Applicant: Korea Polytechnic University Industry Academic Cooperation Foundation
- Applicant Address: KR Siheung-si, Gyeonggi-do
- Assignee: Korea Polytechnic University Industry Academic Cooperation Foundation
- Current Assignee: Korea Polytechnic University Industry Academic Cooperation Foundation
- Current Assignee Address: KR Siheung-si, Gyeonggi-do
- Agency: Workman Nydegger
- Priority: KR10-2013-0043944 20130422; KR10-2013-0050633 20130506
- International Application: PCT/KR2014/002642 WO 20140328
- International Announcement: WO2014/175564 WO 20141030
- Main IPC: H01L33/42
- IPC: H01L33/42 ; H01L33/32 ; H01L33/00 ; H01L33/40 ; H01L33/38 ; H01L33/22

Abstract:
A vertical type light emitting diode includes a nitride semiconductor having a p-n conjunction structure with a transparent material layer formed on a p type clad layer, the transparent material layer having a refractive index different from that of the p type clad layer and having a pattern structure of mesh, punched plate, or one-dimensional grid form, etc. A reflective metal electrode layer is formed on the transparent material layer as a p-electrode. A stereoscopic pattern is formed in the transparent material layer and the p-electrode deposited, and thereby forming the pattern in the p-electrode. Depositing the p-electrode on only 10 to 70% of the upper portion of the p type clad layer in an ultraviolet ray light emitting diode such that an area where the p type clad layer is exposed is wide increases the transmittance of ultraviolet rays through an area where the p-electrode is not deposited.
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