Invention Grant
- Patent Title: System and method for providing an electron blocking layer with doping control
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Application No.: US15215968Application Date: 2016-07-21
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Publication No.: US10014439B2Publication Date: 2018-07-03
- Inventor: Joseph M. Freund , John M. DeLucca
- Applicant: Avago Technologies General IP (Singapore) Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
- Current Assignee: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Sheridan Ross P.C.
- Main IPC: H01L33/14
- IPC: H01L33/14 ; H01L21/02 ; H01L21/22 ; H01L29/15

Abstract:
Aspects of the disclosure pertain to a system and method for providing an electron blocking layer with doping control. The electron blocking layer is included in a semiconductor assembly. The electron blocking layer includes a lithium aluminate layer. The lithium aluminate layer promotes reduced diffusion of magnesium into a layer stack of the semiconductor assembly.
Public/Granted literature
- US20160329463A1 SYSTEM AND METHOD FOR PROVIDING AN ELECTRON BLOCKING LAYER WITH DOPING CONTROL Public/Granted day:2016-11-10
Information query
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