Invention Grant
- Patent Title: Power semiconductor devices, methods, and structures with embedded dielectric layers containing permanent charges
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Application No.: US14445942Application Date: 2014-07-29
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Publication No.: US10014365B2Publication Date: 2018-07-03
- Inventor: Mohamed N. Darwish , Jun Zeng , Richard A. Blanchard
- Applicant: MaxPower Semiconductor, Inc.
- Applicant Address: US CA San Jose
- Assignee: MaxPower Semiconductor Inc.
- Current Assignee: MaxPower Semiconductor Inc.
- Current Assignee Address: US CA San Jose
- Agency: Groover & Associates PLLC
- Agent Gwendolyn G. Corcoran; Robert O. Groover, III
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/06 ; H01L29/40 ; H01L29/861 ; H01L29/423 ; H01L29/66 ; H01L29/10 ; H01L29/08 ; H01L21/265

Abstract:
Power devices using refilled trenches with permanent charge at or near their sidewalls. These trenches extend vertically into a drift region.
Public/Granted literature
Information query
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