Invention Grant
- Patent Title: Atomic layer deposition apparatus and loading methods
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Application No.: US13645712Application Date: 2012-10-05
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Publication No.: US10011904B2Publication Date: 2018-07-03
- Inventor: Sven Lindfors , Juha A. Kustaa-Adolf Poutiainen
- Applicant: Picosun Oy
- Applicant Address: FI Espoo
- Assignee: Picosun Oy
- Current Assignee: Picosun Oy
- Current Assignee Address: FI Espoo
- Agency: Harrington & Smith
- Main IPC: B65H1/00
- IPC: B65H1/00 ; C23C16/455 ; C23C16/44 ; H01L21/67 ; H01L21/677

Abstract:
The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.
Public/Granted literature
- US20130029042A1 Atomic Layer Deposition Apparatus And Loading Methods Public/Granted day:2013-01-31
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