A vortex beam device includes: a metal reflector (101), a low refractive index layer (102), and multiple elliptical dielectric elements (103). The metal reflector (101) is covered by the low refractive index layer (102). The multiple elliptical dielectric elements (103) are embedded in the low refractive index layer (102). The multiple elliptical dielectric elements (103) are arranged in an array. Straight lines on which major axes of the multiple elliptical dielectric elements (103) are located are parallel or coincident. The multiple elliptical dielectric elements (103) have a same thickness. A thickness of the low refractive index layer (102) is greater than a thickness of the elliptical dielectric element (103). An outer surface of each elliptical dielectric element (103) is flush with an outer surface of the low refractive index layer (102). The outer surface of the elliptical dielectric element and the outer surface of the low refractive index layer (102) are both surfaces that are relatively distant from the metal reflector (101). A refractive index of the low refractive index layer (102) is less than a refractive index of the elliptical dielectric element (103). A vortex beam device production method and a vortex beam generation method are also disclosed.