A photosensitive resin composition, containing ultraviolet photosensitive prepolymer resin, an active diluting monomer, an oxime ester photoinitiator represented by formula (I), and a colorant. The composition has good exposure sensibility and developing property. When a system is low in opacifier content or low in exposure dose, a cured pattern is complete, clear to develop and high in resolution ratio, and the adaptation between the cured pattern and a substrate is excellent. The photosensitive resin composition has a great application prospect in terms of optical color filters, light spacers, rib barriers and the like.